The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 16, 2021
Filed:
Dec. 22, 2016
Asml Netherlands B.v., Veldhoven, NL;
Christianus Wilhelmus Johannes Berendsen, Eindhoven, NL;
Güneş Nakibo{hacek over (g)}lu, Eindhoven, NL;
Daan Daniel Johannes Antonius Van Sommeren, Beuningen, NL;
Gijsbert Rispens, Eersel, NL;
Johan Franciscus Maria Beckers, Veldhoven, NL;
Theodorus Johannes Antonius Renckens, Breda, NL;
ASML NETHERLANDS B.V., Veldhoven, NL;
Abstract
A method of processing a substrate includes: providing a substrate with a layer of photosensitive material on a surface of the substrate; and removing at least part of the photosensitive material from around an outer edge of the layer of photosensitive material so as to generate an edge, having a radial width, around the layer of photosensitive material remaining on the surface of the substrate, wherein the photosensitive material varies in thickness forming a thickness profile across the radial width and the removing is controlled so as to generate variation in the thickness profile along the length of the edge, and/or wherein the removing is controlled so as to generate a rough edge around the layer of photosensitive material remaining on the surface of the substrate.