The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 09, 2021

Filed:

Dec. 20, 2018
Applicant:

Infineon Technologies Ag, Neubiberg, DE;

Inventors:

Elmar Falck, Hohenbrunn, DE;

Franz-Josef Niedernostheide, Hagen a. T.W., DE;

Hans-Joachim Schulze, Taufkirchen, DE;

Assignee:

Infineon Technologies AG, Neubiberg, DE;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 29/06 (2006.01); H01L 21/225 (2006.01); H01L 21/78 (2006.01); H01L 21/265 (2006.01); H01L 21/266 (2006.01); H01L 21/02 (2006.01); H01L 29/66 (2006.01); H01L 29/739 (2006.01); H01L 29/78 (2006.01);
U.S. Cl.
CPC ...
H01L 29/0638 (2013.01); H01L 21/2253 (2013.01); H01L 21/266 (2013.01); H01L 21/26513 (2013.01); H01L 21/78 (2013.01); H01L 29/0619 (2013.01); H01L 21/02238 (2013.01); H01L 21/02255 (2013.01); H01L 29/66333 (2013.01); H01L 29/66712 (2013.01); H01L 29/7395 (2013.01); H01L 29/7811 (2013.01);
Abstract

A channel stopper region extending from a first main surface into a component layer of a first conductivity type is formed in an edge region of a component region, the edge region being adjacent to a sawing track region. Afterward, a doped region extending from the first main surface into the component layer is formed in the component region. The channel stopper region is formed by a photolithographic method that is carried out before a first photolithographic method for introducing dopants into a section of the component region outside the channel stopper region.


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