The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 09, 2021

Filed:

Oct. 29, 2018
Applicant:

Disco Corporation, Tokyo, JP;

Inventors:

Keiji Nomaru, Tokyo, JP;

Yuji Hadano, Tokyo, JP;

Masatoshi Nayuki, Tokyo, JP;

Assignee:

DISCO CORPORATION, Tokyo, JP;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B23K 26/142 (2014.01); H01L 21/687 (2006.01); B23K 26/08 (2014.01); B23K 26/359 (2014.01); B23K 26/122 (2014.01); H01L 21/67 (2006.01); B23K 26/146 (2014.01); B23K 26/364 (2014.01); B23K 26/38 (2014.01); H01L 21/82 (2006.01); B23K 26/06 (2014.01); B23K 26/046 (2014.01); B23K 26/12 (2014.01); B23K 26/082 (2014.01); B23K 103/00 (2006.01); B23K 101/40 (2006.01);
U.S. Cl.
CPC ...
B23K 26/142 (2015.10); B23K 26/046 (2013.01); B23K 26/0665 (2013.01); B23K 26/083 (2013.01); B23K 26/0821 (2015.10); B23K 26/0823 (2013.01); B23K 26/1224 (2015.10); B23K 26/146 (2015.10); B23K 26/359 (2015.10); B23K 26/364 (2015.10); B23K 26/38 (2013.01); H01L 21/6715 (2013.01); H01L 21/67051 (2013.01); H01L 21/67092 (2013.01); H01L 21/68764 (2013.01); H01L 21/68785 (2013.01); H01L 21/82 (2013.01); B23K 2101/40 (2018.08); B23K 2103/56 (2018.08);
Abstract

A liquid supply mechanism is disposed on an upper portion of a holding unit of a laser processing apparatus. The liquid supply mechanism includes: a liquid chamber having a transparent plate positioned such that a gap is formed between the transparent plate and the top surface of a workpiece held on a holding table; a linear-motion mechanism configured to linearly move the transparent plate over the liquid chamber; a liquid supply nozzle configured to supply a liquid from one side of the liquid chamber to the gap; and a liquid discharge nozzle configured to discharge the liquid from another side of the liquid chamber. A laser beam irradiating unit includes a laser oscillator configured to irradiate the workpiece through the transparent plate and the liquid supplied to the gap.


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