The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 02, 2021

Filed:

Jan. 18, 2019
Applicant:

Samsung Display Co., Ltd., Yongin-si, KR;

Inventors:

Yunmo Chung, Yongin-si, KR;

Takyoung Lee, Yongin-si, KR;

Ilhun Seo, Yongin-si, KR;

Hojin Yoon, Yongin-si, KR;

Daewoo Lee, Yongin-si, KR;

Assignee:

SAMSUNG DISPLAY CO., LTD., Yongin-si, KR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 29/08 (2006.01); H01L 27/32 (2006.01); H01L 51/52 (2006.01); H01L 51/56 (2006.01); H01L 51/50 (2006.01);
U.S. Cl.
CPC ...
H01L 27/3223 (2013.01); H01L 27/3258 (2013.01); H01L 27/3262 (2013.01); H01L 27/3276 (2013.01); H01L 51/5012 (2013.01); H01L 51/52 (2013.01); H01L 51/5206 (2013.01); H01L 51/5221 (2013.01); H01L 51/56 (2013.01); H01L 2227/323 (2013.01); H01L 2251/558 (2013.01);
Abstract

A display apparatus and a method of manufacturing a display apparatus, the display apparatus including a first area, the first area including a structure of thin layers on a substrate; a second area, the second area including a structure of thin layers on the substrate; a planarization layer that planarizes the first area and the second area; and a step-height compensation layer, wherein the structure of thin layers of the first area is different from the structure of thin layers of the second area, the step-height compensation layer compensates for a height difference between the first area and the second area due to the different structures of thin layers, and the step-height compensation layer is between the substrate and the planarization layer and in the first area or the second area.


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