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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 10937675 B1

PDFFull Text
Date of Patent:
Mar. 02, 2021

Filed:

Dec. 12, 2018

Substrate processing apparatus, substrate processing apparatus control method, and storage medium storing program

Applicant:

Ebara Corporation, Tokyo, JP;

Inventor:

Gaku Yamasaki, Tokyo, JP;

Assignee:

EBARA CORPORATION, Tokyo, JP;

Attorney:

Abelman, Frayne & Schwab

Primary Examiner:

Thomas C Lee

Assistant Examiner:

Michael Tang

Int. Cl.
CPC ...
H01L 21/67 (2006.01); C25D 21/12 (2006.01); C25D 17/00 (2006.01); G05B 19/418 (2006.01); H01L 21/677 (2006.01); C25D 17/06 (2006.01); H01L 21/68 (2006.01);
U.S. Cl.
CPC ...
H01L 21/67259 (2013.01); C25D 17/001 (2013.01); C25D 17/06 (2013.01); C25D 21/12 (2013.01); G05B 19/4189 (2013.01); H01L 21/67766 (2013.01); H01L 21/67778 (2013.01); H01L 21/681 (2013.01); G05B 2219/45031 (2013.01);
Abstract

A substrate processing apparatus includes: a stage configured to place thereon a substrate or at least a portion of a substrate holding member configured to hold the substrate, the substrate having two sides extending in a first direction and two sides extending in a second direction; a transporter configured to transport the substrate to a position facing the stage; first and second sensors, which are fixed relative to the stage and respectively located outside the sides, extending in the second direction, of the substrate at the position facing the stage so as to detect the sides of the substrate, respectively; and third and fourth sensors, which are fixed relative to the stage and respectively located outside the sides, extending in the first direction, of the substrate at the position facing the stage so as to detect the sides of the substrate, respectively.

Find Patent Forward Citations

Yamasaki, Gaku. (2021). Substrate processing apparatus, substrate processing apparatus control method, and storage medium storing program (U.S. Patent No. 10937675). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/10937675

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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