The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 02, 2021

Filed:

Mar. 26, 2018
Applicant:

Mitsubishi Heavy Industries, Ltd., Tokyo, JP;

Inventors:

Kentaro Hayashi, Tokyo, JP;

Takahiro Nakano, Tokyo, JP;

Atsushi Yuge, Tokyo, JP;

Masaaki Shibata, Tokyo, JP;

Assignee:
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
G01M 13/028 (2019.01); G01M 13/045 (2019.01); F03D 17/00 (2016.01); G05B 23/02 (2006.01);
U.S. Cl.
CPC ...
G01M 13/028 (2013.01); F03D 17/00 (2016.05); G01M 13/045 (2013.01); G05B 23/024 (2013.01); G05B 23/0281 (2013.01); F05B 2220/706 (2013.01); F05B 2260/80 (2013.01);
Abstract

A facility condition monitoring device includes an abnormality-degree-calculation-model construction part which constructs an abnormality-degree-calculation model for calculating an abnormality degree of a monitoring feature group of a monitoring target facility, based on a normal feature group extracted from a state-quantity fluctuation data of the monitoring target facility, an abnormality degree calculation part which calculates the abnormality degree of the monitoring feature group with the abnormality-degree-calculation model, an abnormality determination part which determines whether the monitoring target facility is abnormal, based on the abnormality degree, an abnormality-contribution-rate calculation part which obtains a contribution rate of each feature constituting the monitoring feature group used for calculating the abnormality degree determined as abnormal by the abnormality determination part, and an abnormality cause identification part which identifies an abnormality cause of the monitoring target facility, based on the contribution rate and a cause-and-effect matrix representing a relationship between the abnormality cause and the features.


Find Patent Forward Citations

Loading…