The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 02, 2021
Filed:
Jan. 09, 2018
Applicant:
Hitachi Kokusai Electric Inc., Tokyo, JP;
Inventors:
Teruo Yoshino, Toyama, JP;
Naofumi Ohashi, Toyama, JP;
Tadashi Takasaki, Toyama, JP;
Shun Matsui, Toyama, JP;
Assignee:
KOKUSAI ELECTRIC CORPORATION, Tokyo, JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C23C 16/48 (2006.01); C23C 16/458 (2006.01); C23C 16/46 (2006.01); H01L 21/67 (2006.01); H01L 21/687 (2006.01); C23C 16/455 (2006.01); C23C 16/50 (2006.01); C23C 16/40 (2006.01); C23C 16/34 (2006.01);
U.S. Cl.
CPC ...
C23C 16/481 (2013.01); C23C 16/345 (2013.01); C23C 16/402 (2013.01); C23C 16/4584 (2013.01); C23C 16/4586 (2013.01); C23C 16/45523 (2013.01); C23C 16/46 (2013.01); C23C 16/50 (2013.01); H01L 21/67103 (2013.01); H01L 21/67109 (2013.01); H01L 21/67161 (2013.01); H01L 21/67248 (2013.01); H01L 21/68764 (2013.01); H01L 21/68771 (2013.01); H01L 21/68785 (2013.01); H01L 21/68742 (2013.01);
Abstract
A substrate processing apparatus includes a heat storage part on which a substrate is mounted, a tray including the heat storage part, a substrate transfer part including a rotary shaft and a rotating plate supported by the rotary shaft and being configured such that the tray can be mounted on the rotating plate, a plurality of bases arranged circumferentially around the rotary shaft; and a heater provided for each of the bases.