The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 23, 2021
Filed:
Dec. 13, 2016
Asml Netherlands B.v., Veldhoven, NL;
Pieter Willem Herman De Jager, Middelbeers, NL;
Coen Adrianus Verschuren, Eindhoven, NL;
Erwin Paul Smakman, Eindhoven, NL;
Erwin John Van Zwet, Pijnacker, NL;
Wouter Frans Willem Mulckhuyse, Bussum, NL;
Pieter Verhoeff, Den Hoorn Z.H., NL;
Robert Albertus Johannes Van Der Werf, Eindhoven, NL;
ASML NETHERLANDS B.V., Veldhoven, NL;
Abstract
An exposure apparatus including: a substrate holder constructed to support a substrate; a patterning device configured to provide radiation modulated according to a desired pattern, the patterning device including a plurality of two-dimensional arrays of radiation sources, each radiation source configured to emit a radiation beam; a projection system configured to project the modulated radiation onto the substrate, the projection system including a plurality of optical elements arranged side by side and arranged such that a two-dimensional array of radiation beams from a two-dimensional array of radiation sources impinges a single optical element of the plurality of optical elements; and an actuator configured to provide relative motion between the substrate and the plurality of two-dimensional arrays of radiation sources in a scanning direction to expose the substrate.