The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 23, 2021
Filed:
Jul. 04, 2018
Zhen Ding Technology Co., Ltd., Taoyuan, TW;
Chen-Feng Yen, Taoyuan, TW;
Shou-Jui Hsiang, Taoyuan, TW;
Pei-Jung Wu, Taoyuan, TW;
Szu-Hsiang Su, Taoyuan, TW;
Zhen Ding Technology Co., Ltd., Taoyuan, TW;
Abstract
A photosensitive resin composition comprises a modified polyimide polymer having a chemical structural formula of: photosensitive monomers, a bisphenol A epoxy resin, a photo-initiator, and a pigment. The modified polyimide polymer is made by a reaction of a polyimide polymer having a chemical structural formula of: and glycidyl methacrylate. The carboxyl group of the polyimide polymer reacts with the epoxy group of glycidyl methacrylate. The polyimide polymer is made by a reaction of dianhydride monomers each having an A group, diamine monomers each having the R group, diamine monomers each having the Rgroup, and diamine monomers each having the Rgroup. The diamine monomer having R group is a diamine compound having R group bonding with the carboxyl group. The diamine monomer having Rgroup is a soft long-chain diamine monomer. Rgroup comprises at least one secondary amine group or tertiary amine group.