The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 23, 2021

Filed:

Jun. 19, 2017
Applicant:

C. Uyemura & Co., Ltd., Osaka, JP;

Inventors:

Yoshikazu Saijo, Osaka, JP;

Hisamitsu Yamamoto, Osaka, JP;

Nobuhiko Naka, Osaka, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 18/26 (2006.01); H05K 3/18 (2006.01); C23C 18/16 (2006.01); C23C 18/18 (2006.01); C11D 7/04 (2006.01); C11D 7/10 (2006.01);
U.S. Cl.
CPC ...
C23C 18/26 (2013.01); C11D 7/04 (2013.01); C11D 7/10 (2013.01); C23C 18/16 (2013.01); C23C 18/18 (2013.01); H05K 3/18 (2013.01); H05K 3/182 (2013.01); H05K 2203/072 (2013.01);
Abstract

A novel pretreating liquid for electroless plating which is used simultaneously with reduction treatment after roughening treatment of a filler-containing insulating resin substrate. A pretreating liquid for electroless plating is used simultaneously with reduction treatment when an insulating resin substrate containing a filler is roughened and residues generated on the insulating resin substrate are reduced. The pretreating liquid comprises: a reducing agent; and at least one selected from the group consisting of ethylene-based glycol ether represented by CmH(2m+1)-(OCH)n-OH (m=an integer of 1 to 4, n=an integer of 1 to 4) and propylene-based glycol ether represented by CxH(2x+1)-(OCH)y-OH (x=an integer of 1 to 4, y= an integer of 1 to 3).


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