The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 16, 2021

Filed:

Jun. 26, 2019
Applicant:

Disco Corporation, Tokyo, JP;

Inventor:

Noboru Takeda, Tokyo, JP;

Assignee:

DISCO CORPORATION, Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/78 (2006.01); H01L 21/268 (2006.01);
U.S. Cl.
CPC ...
H01L 21/78 (2013.01); H01L 21/268 (2013.01);
Abstract

A wafer processing method of dividing a wafer into a plurality of chips along a plurality of division lines includes: a shield tunnel forming step of causing a focusing point of a pulsed laser beam of a wavelength having a transmitting property with respect to the wafer to be positioned inside the wafer and applying the pulsed laser beam, and then forming a plurality of shield tunnels each including a fine hole and an amorphous region shielding the fine hole along the division lines; and a wafer dividing step of applying an external force to the wafer and then dividing the wafer in which the shield tunnels are formed along the division lines, in which the pulsed laser beam is split to have two or more of the focusing points which are along a direction parallel to the division lines.


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