The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 16, 2021
Filed:
Jun. 28, 2018
Tokyo Electron Limited, Tokyo, JP;
Takashi Suzuki, Miyagi, JP;
Yoshikazu Azumaya, Miyagi, JP;
TOKYO ELECTRON LIMITED, Tokyo, JP;
Abstract
A plasma generating unit capable of improving in-surface uniformity of plasma and a plasma processing apparatus using the same are provided. The plasma generating unit provided in the plasma processing apparatus includes a dielectric window; a slot plateprovided on the dielectric window; and a coaxial waveguide electrically connected to the slot plateand configured to transmit a microwave. The coaxial waveguide includes an inner conductor; and an outer conductorconfigured to surround the inner conductor. The plasma generating unit further includes a pressing component PM configured to elastically press the inner conductortoward the slot plate.