The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 16, 2021
Filed:
Dec. 04, 2017
Applicant:
Jeol Ltd., Tokyo, JP;
Inventor:
Akiho Nakamura, Tokyo, JP;
Assignee:
JEOL Ltd., Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/22 (2006.01); H01J 37/28 (2006.01); H01J 37/20 (2006.01); H01J 37/147 (2006.01); H01J 37/244 (2006.01); G01N 23/041 (2018.01); G01N 9/24 (2006.01);
U.S. Cl.
CPC ...
H01J 37/222 (2013.01); G01N 9/24 (2013.01); G01N 23/041 (2018.02); H01J 37/147 (2013.01); H01J 37/20 (2013.01); H01J 37/244 (2013.01); H01J 37/28 (2013.01); H01J 2237/20207 (2013.01); H01J 2237/221 (2013.01); H01J 2237/24578 (2013.01); H01J 2237/2614 (2013.01); H01J 2237/2617 (2013.01); H01J 2237/2802 (2013.01); H01J 2237/2803 (2013.01); H01J 2237/2804 (2013.01); H01J 2237/2809 (2013.01);
Abstract
There is provided a method of image acquisition capable of reducing the effects of diffraction contrast. This method of image acquisition is implemented in an electron microscope for generating electron microscope images with electrons transmitted through a sample. The method starts with obtaining the plural electron microscope images while causing relative variations in the direction of incidence of an electron beam with respect to the sample. An image is generated by accumulating the plural electron microscope images.