The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 16, 2021

Filed:

Oct. 17, 2019
Applicant:

Ict Integrated Circuit Testing Gesellschaft Für Halbleiterprüftechnik Mbh, Heimstetten, DE;

Inventor:

Benjamin John Cook, Munich, DE;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01J 37/153 (2006.01); H01J 37/09 (2006.01); H01J 37/147 (2006.01); H01J 37/10 (2006.01);
U.S. Cl.
CPC ...
H01J 37/153 (2013.01); H01J 37/09 (2013.01); H01J 37/10 (2013.01); H01J 37/1474 (2013.01); H01J 2237/0453 (2013.01); H01J 2237/1534 (2013.01);
Abstract

The charged particle beam device includes a charged particle source and a beamlet-forming multiaperture plate. The device also includes a precompensator for reducing aberrations of the beamlets at a target, a scanner for scanning each of the beamlets, an objective lens for focusing each beamlet onto the target, and a controller configured to synchronize the precompensator and the scanner. The precompensator includes: at least one 'radially variable' multiaperture electrode in which the diameter of each aperture thereof scales with the distance of the aperture from the optical axis, z; and at least one 'cartesianally variable' multiaperture electrode in which the diameter of each aperture thereof scales with an x component of the position of the aperture.


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