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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 10921711 B1

PDFFull Text
Date of Patent:
Feb. 16, 2021

Filed:

Mar. 16, 2018

Resist composition and method of forming resist pattern

Applicant:

Tokyo Ohka Kogyo Co., Ltd., Kawasaki, JP;

Inventors:

Masafumi Fujisaki, Kawasaki, JP;

Junichi Tsuchiya, Kawasaki, JP;

Kotaro Endo, Kawasaki, JP;

Assignee:

TOKYO OHKA KOGYO CO., LTD., Kawasaki, JP;

Attorney:

Knobbe, Martens, Olson & Bear LLP

Primary Examiner:

Cynthia Hamilton

Int. Cl.
CPC ...
G03F 7/039 (2006.01); G03F 7/16 (2006.01); G03F 7/20 (2006.01); G03F 7/38 (2006.01); G03F 7/32 (2006.01); G03F 7/038 (2006.01); C08F 220/28 (2006.01); C08F 220/16 (2006.01);
U.S. Cl.
CPC ...
G03F 7/0397 (2013.01); C08F 220/16 (2013.01); C08F 220/28 (2013.01); G03F 7/0382 (2013.01); G03F 7/162 (2013.01); G03F 7/168 (2013.01); G03F 7/2006 (2013.01); G03F 7/2041 (2013.01); G03F 7/325 (2013.01); G03F 7/38 (2013.01); C08F 220/281 (2020.02); C08F 220/282 (2020.02);
Abstract

A resist composition which generates an acid when exposed and whose solubility in a developer is changed by an action of an acid, the resist composition including: a base material component (A) whose solubility in a developer is changed by an action of an acid, in which the base material component (A) comprises a polymer compound (A1) having a constitutional unit (a01) represented by Formula (a0-1), a constitutional unit (a02) represented by Formula (a0-2), and a constitutional unit (a03) which is represented by Formula (a0-3) and has a structure different from the constitutional unit (a02).

Find Patent Forward Citations

Fujisaki, Masafumi. (2021). Resist composition and method of forming resist pattern (U.S. Patent No. 10921711). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/10921711

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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