The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 16, 2021

Filed:

Dec. 12, 2017
Applicant:

Commissariat a L'energie Atomique ET Aux Energies Alternatives, Paris, FR;

Inventors:

Patrick Quemere, Voreppe, FR;

Jérôme Hazart, Eybens, FR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01N 23/2251 (2018.01);
U.S. Cl.
CPC ...
G01N 23/2251 (2013.01); G01N 2223/401 (2013.01); G01N 2223/418 (2013.01); G01N 2223/611 (2013.01);
Abstract

A method for implementing a scanning electron microscopy characterisation technique for the determination of at least one critical dimension of the structure of a sample in the field of dimensional metrology, known as CD-SEM technique, includes producing an experimental image; from a first theoretical model based on parametric mathematical functions, calculating a second theoretical model U(P,t) describing the signal measured at the position Pat the instant t, the second model U(P,t) being obtained by algebraic summation of a corrective term S(P,t); determining the set of parameters present in the second theoretical model; wherein the corrective term S(P,t) is calculated by summing the signal coming from the electric charges deposited by the primary electron beam at a plurality of instants t less than or equal to t.


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