The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 16, 2021

Filed:

Apr. 13, 2017
Applicant:

Nuflare Technology, Inc., Kanagawa, JP;

Inventors:

Takumi Yamada, Yokohama, JP;

Yuusuke Sato, Tokyo, JP;

Assignee:

NuFlare Technology, Inc., Kanagawa, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/455 (2006.01); C23C 16/44 (2006.01); C23C 16/458 (2006.01); H01L 21/02 (2006.01);
U.S. Cl.
CPC ...
C23C 16/45565 (2013.01); C23C 16/4401 (2013.01); C23C 16/458 (2013.01); C23C 16/45519 (2013.01); C23C 16/45572 (2013.01); H01L 21/02598 (2013.01); H01L 21/0254 (2013.01); H01L 21/0262 (2013.01);
Abstract

A shower head that supplies a process gas in a vapor phase growth apparatus includes a mixing chamber; and a plurality of cooling portions provided below the mixing chamber with gaps between cooling portions. The cooling portion includes a cooling hole provided in a horizontal direction, and the gaps extend linearly in the horizontal direction. The shower head further includes, below the gaps, a plurality of buffer regions extending linearly in the horizontal direction. The shower head further includes, below the buffer regions, a shower plate including a plurality of through holes disposed at a predetermined interval. The shower head can uniformly supply the process gas.


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