The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 09, 2021

Filed:

Jan. 08, 2019
Applicant:

Samsung Electronics Co., Ltd., Suwon-si, KR;

Inventors:

Kwan-young Kim, Seoul, KR;

Aliaksei Ivaniukovich, Yongin-si, KR;

Hui-chul Shin, Uijeongbu-si, KR;

Mi-jin Han, Gunpo-si, KR;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 29/66 (2006.01); H01L 29/78 (2006.01); H01L 29/08 (2006.01); H01L 29/40 (2006.01); H01L 29/423 (2006.01);
U.S. Cl.
CPC ...
H01L 29/7824 (2013.01); H01L 29/086 (2013.01); H01L 29/0878 (2013.01); H01L 29/402 (2013.01); H01L 29/42368 (2013.01); H01L 29/66681 (2013.01);
Abstract

An integrated circuit device includes a bulk substrate including a first conductivity type well and a second conductivity type drift region, a stack pattern disposed on the bulk substrate and including a buried insulation pattern on the second conductivity type drift region and a semiconductor body pattern on the buried insulation pattern, a gate insulation layer on an upper surface of the first conductivity type well and on a sidewall and an upper surface of the stack pattern, and a gate electrode on the gate insulation layer. The gate electrode includes a first gate portion opposite to the first conductivity type well with the gate insulation layer therebetween and a second gate portion opposite to the second conductivity type drift region with the gate insulation layer and the stack pattern therebetween.


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