The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 09, 2021
Filed:
Jun. 28, 2019
Intel Corporation, Santa Clara, CA (US);
Bikram Baidya, Portland, OR (US);
Vivek K. Singh, Portland, OR (US);
Allan Gu, Portland, OR (US);
Abde Ali Hunaid Kagalwalla, Hillsboro, OR (US);
Saumyadip Mukhopadhyay, Beaverton, OR (US);
Kumara Sastry, Hillsboro, OR (US);
Daniel L. Stahlke, Hillsboro, OR (US);
Kritika Upreti, Sunnyvale, CA (US);
Intel Corporation, Santa Clara, CA (US);
Abstract
A semantic pattern extraction system can distill tremendous amounts of silicon wafer manufacturing data to generate a small set of simple sentences (semantic patterns) describing physical design geometries that may explain manufacturing defects. The system can analyze many SEM images for manufacturing defects in areas of interest on a wafer. A tagged continuous itemset is generated from the images, with items comprising physical design feature values corresponding to the areas of interest and tagged with the presence or absence of a manufacturing defect. Entropy-based discretization converts the continuous itemset into a discretized one. Frequent set mining identifies a set of candidate semantic patterns from the discretized itemset. Candidate semantic patterns are reduced using reduction techniques and are scored. A ranked list of final semantic patterns is presented to a user. The final semantic patterns can be used to improve a manufacturing process.