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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 10910412 B1

PDFFull Text
Date of Patent:
Feb. 02, 2021

Filed:

Mar. 18, 2019

Etchant composition, and method for manufacturing metal pattern and array substrate using the same

Applicant:

Samsung Display Co., Ltd., Yongin-si, KR;

Inventors:

Bong-Kyun Kim, Hwaseong-si, KR;

Jinsuek Kim, Daejeon, KR;

Seungbo Shim, Asan-si, KR;

Shinhyuk Choi, Suwon-si, KR;

Woonhyung Shim, Sejong-si, KR;

Donghee Lee, Hwaseong-si, KR;

Assignee:

Samsung Display Co., Ltd., Yongin-si, KR;

Attorney:

H.C. Park & Associates, PLC

Primary Examiner:

Angel Roman

Int. Cl.
CPC ...
H01L 27/12 (2006.01); H01L 21/3213 (2006.01); G02F 1/1362 (2006.01); C09K 13/06 (2006.01); C09K 13/08 (2006.01);
U.S. Cl.
CPC ...
H01L 27/1244 (2013.01); C09K 13/06 (2013.01); C09K 13/08 (2013.01); G02F 1/136286 (2013.01); H01L 21/32134 (2013.01); H01L 21/32139 (2013.01); H01L 27/1288 (2013.01); G02F 2001/136295 (2013.01); H01L 27/124 (2013.01); H01L 27/1259 (2013.01);
Abstract

An etchant composition including a persulfate, a four-nitrogen ring compound, a carbonyl ring compound having two or more carbonyl groups, and water, and having a weight ratio of the four-nitrogen ring compound and the carbonyl ring compound of about 1:0.1 to about 1:2. The etchant composition may etch a multilayer of titanium/copper and may be used for manufacturing a metal pattern and an array substrate having excellent properties of an etched pattern.

Find Patent Forward Citations

Kim, Bong-Kyun. (2021). Etchant composition, and method for manufacturing metal pattern and array substrate using the same (U.S. Patent No. 10910412). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/10910412

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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