The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 02, 2021

Filed:

Apr. 17, 2019
Applicant:

Unisantis Electronics Singapore Pte. Ltd., Singapore, SG;

Inventors:

Fujio Masuoka, Tokyo, JP;

Masamichi Asano, Tokyo, JP;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G11C 11/418 (2006.01); H01L 27/092 (2006.01); H01L 21/8238 (2006.01); G11C 8/08 (2006.01); G11C 8/10 (2006.01); H01L 27/11 (2006.01); H01L 29/423 (2006.01); G11C 5/06 (2006.01); H01L 29/16 (2006.01); H01L 29/78 (2006.01);
U.S. Cl.
CPC ...
G11C 11/418 (2013.01); G11C 5/063 (2013.01); G11C 8/08 (2013.01); G11C 8/10 (2013.01); H01L 21/823885 (2013.01); H01L 27/092 (2013.01); H01L 27/1104 (2013.01); H01L 27/1108 (2013.01); H01L 27/1116 (2013.01); H01L 29/16 (2013.01); H01L 29/42356 (2013.01); H01L 29/42392 (2013.01); H01L 29/7827 (2013.01);
Abstract

A semiconductor device constituting a decoder circuit for memory selection and having a smaller area is provided by using surrounding gate transistors (SGTs), which are vertical transistors. In a decoder circuit formed by a plurality of MOS transistors arranged in m rows and n columns, the MOS transistors that constitute the decoder circuit are arranged on a planar silicon layer formed on a substrate. Each has a structure including a drain, a gate, and a source arranged in a vertical direction, the gate surrounding a semiconductor pillar. The planar silicon layer is formed by a first active region of a first conductivity type and a second active region of a second conductivity type, and the regions are connected to each other via a conductive region formed on the surface of the planar silicon layer. Consequently, a semiconductor device that constitutes a decoder circuit having a smaller area is provided.


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