The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 02, 2021

Filed:

Nov. 06, 2018
Applicant:

Bruker Nano Gmbh, Berlin, DE;

Inventors:
Assignee:

BRUKER NANO GMBH, Berlin, DE;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01N 23/223 (2006.01); G21K 1/04 (2006.01); G21K 1/06 (2006.01);
U.S. Cl.
CPC ...
G01N 23/223 (2013.01); G01N 2223/076 (2013.01); G01N 2223/204 (2013.01); G01N 2223/316 (2013.01); G01N 2223/3301 (2013.01); G01N 2223/6113 (2013.01); G21K 1/04 (2013.01); G21K 1/067 (2013.01);
Abstract

The present invention relates to an X-ray fluorescence, XRF, spectrometer, for measuring X-ray fluorescence emitted by a target, wherein the XRF spectrometer comprises an X-ray tube with an anode to emit a divergent X-ray beam, a capillary lens that is configured to focus the divergent X-ray beam on the target, an aperture system that is positioned between the anode of the X-ray tube and the capillary lens and comprises at least one pinhole, and a detector that is configured for detecting X-ray fluorescence radiation emitted by the target, wherein the at least one pinhole is configured for being inserted into the divergent X-ray beam and for reducing a beam cross section of the divergent X-ray beam between the anode and the capillary lens. The present invention further relates to an aperture system for a spectrometer, to the use of an aperture system for adjusting the focal depth of a spectrometer and to a method for adjusting the focal depth of as spectrometer.


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