The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 26, 2021

Filed:

Sep. 06, 2018
Applicant:

Shibaura Mechatronics Corporation, Yokohama, JP;

Inventors:

Daisuke Ono, Yokohama, JP;

Yu Kambe, Yokohama, JP;

Assignee:
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
C23C 14/34 (2006.01); H01J 37/34 (2006.01); H01J 37/32 (2006.01); C23C 14/00 (2006.01); C23C 14/50 (2006.01); H01L 21/687 (2006.01); C23C 14/08 (2006.01); H01L 21/02 (2006.01); H01L 21/285 (2006.01);
U.S. Cl.
CPC ...
H01J 37/3488 (2013.01); C23C 14/0078 (2013.01); C23C 14/08 (2013.01); C23C 14/34 (2013.01); C23C 14/505 (2013.01); H01J 37/32513 (2013.01); H01J 37/32651 (2013.01); H01J 37/32733 (2013.01); H01J 37/32779 (2013.01); H01J 37/34 (2013.01); H01J 37/347 (2013.01); H01J 37/3441 (2013.01); H01L 21/68764 (2013.01); H01L 21/68771 (2013.01); H01L 21/02244 (2013.01); H01L 21/02252 (2013.01); H01L 21/2855 (2013.01);
Abstract

A film formation apparatus includes a chamber which has an interior capable of being vacuumed, and which includes a lid that is openable and closable on the upper part of the chamber, a rotation table which is provided in the chamber and which and carries a workpiece in the circular trajectory, a film formation unit that deposits film formation materials by sputtering on the workpiece carried by the rotation table to form films, a shielding member which is provided with an opening at the side which the workpiece passes through, and which forms a film formation room where the film formations by the film formation units are performed, and a support which supports the shielding member, and which is independent relative to the chamber and is independent from the lid.


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