The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 26, 2021
Filed:
Dec. 21, 2018
Voti Inc., St-Laurent, CA;
Emmanuel St-Aubin, St-Laurent, CA;
Philippe Desjeans-Gauthier, St-Laurent, CA;
Ola El Bakry, St-Laurent, CA;
Simon Archambault, St-Laurent, CA;
William Awad, St-Laurent, CA;
VOTI INC., Quebec, CA;
Abstract
There is provided a method for assigning an attribute to x-ray attenuation including scanning in an x-ray scanning device first and second reference materials each having known atomic composition, dimensions and orientation in the scanning device. The device emits x-rays which pass through the first reference material with first reference material path lengths and the second reference material with second reference material path lengths. The x-rays are detected by detectors to provide a plurality of dual-energy attenuation images having dual-energy x-ray attenuation information. The dual-energy x-ray attenuation information in the dual-energy attenuation images is associated with the first and second reference material path lengths. Then, each of the first and second reference material path lengths are expressed collectively as a function of the associated attenuation information to define attenuation surfaces upon which may be imposed dual-energy attenuation values to determine corresponding first and second reference material equivalent path lengths.