The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 19, 2021

Filed:

Mar. 28, 2018
Applicant:

Tokyo Electron Limited, Tokyo, JP;

Inventors:

Atsushi Kawabe, Nirasaki, JP;

Keisuke Kondoh, Nirasaki, JP;

Assignee:
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/677 (2006.01); B65G 47/90 (2006.01); H01L 21/67 (2006.01);
U.S. Cl.
CPC ...
H01L 21/67742 (2013.01); B65G 47/907 (2013.01); H01L 21/67017 (2013.01); H01L 21/6719 (2013.01); H01L 21/67173 (2013.01); H01L 21/67196 (2013.01); H01L 21/67201 (2013.01); H01L 21/67745 (2013.01); H01L 21/67748 (2013.01); H01L 21/67754 (2013.01); B65G 2201/0297 (2013.01); H01L 21/67069 (2013.01); H01L 21/67207 (2013.01);
Abstract

A system includes a transfer device for transferring workpieces in an atmospheric atmosphere, a transfer unit for transferring the workpieces in a vacuum atmosphere, and a vacuum processing unit including vacuum process chambers connected to the transfer unit and for performing a process on the workpieces in each process chamber. The vacuum processing unit simultaneously performs the process on the workpieces in each process chamber. The process chambers are arranged along a first direction. The transfer unit includes first and second common transfer devices installed along the first direction to transfer the workpieces along the first direction. The first common transfer device is connected to each process chamber at a first side in a second direction perpendicular to the first direction, the second common transfer device is connected to each process chamber at a second side in the second direction.


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