The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 19, 2021
Filed:
Jun. 23, 2017
Asml Netherlands B.v., Veldhoven, NL;
Taksh Pandey, Austin, TX (US);
Mark Christopher Simmons, Santa Clara, CA (US);
ASML Netherlands B.V., Veldhoven, NL;
Abstract
A process, including: obtaining data specifying a layout of a lithographic pattern; obtaining performance metrics of a computational analysis of the layout, the performance metrics indicating performance of one or more computer processes performing respective portions of the computational analysis; correlating the performance metrics to portions of the layout processed during measurement of the respective performance metrics; and generating a three or higher dimensional visualization based on a result of correlating the performance metrics to portions of the layout processed during measurement, wherein at least some of the visualization dimensions indicate relative positions of portions of the layout and at least some of the visualization dimensions indicate a performance metric correlated to the respective portions.