The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 19, 2021
Filed:
Mar. 30, 2018
Applicant:
Dai Nippon Printing Co., Ltd., Tokyo, JP;
Inventors:
Yasuko Sone, Tokyo, JP;
Hiroshi Kawasaki, Tokyo, JP;
Yoshinori Hirobe, Tokyo, JP;
Katsunari Obata, Tokyo, JP;
Asako Narita, Tokyo, JP;
Hitoshi Ishiro, Tokyo, JP;
Chiaki Hatsuta, Tokyo, JP;
Assignee:
Dai Nippon Printing Co., Ltd., Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/04 (2006.01); C23C 14/04 (2006.01); H01L 51/00 (2006.01); H01L 51/56 (2006.01);
U.S. Cl.
CPC ...
C23C 16/042 (2013.01); C23C 14/042 (2013.01); H01L 51/001 (2013.01); H01L 51/56 (2013.01);
Abstract
A vapor deposition mask includes: a metal mask in which a metal mask opening is provided; and a resin mask in which a resin mask opening corresponding to a pattern to be produced by vapor deposition is provided at a position overlapping with the metal mask opening, the metal mask and the resin mask being stacked, wherein an arithmetic average height (Sa) of a surface of the resin mask exposed from the metal mask opening is not more than 0.8 μm.