The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 12, 2021
Filed:
Apr. 29, 2019
United Microelectronics Corp., Hsin-Chu, TW;
Hao-Hsuan Chang, Kaohsiung, TW;
Bin-Siang Tsai, Changhua County, TW;
Ting-An Chien, Tainan, TW;
Yi-Liang Ye, Kaohsiung, TW;
UNITED MICROELECTRONICS CORP., Hsin-Chu, TW;
Abstract
A method of rounding fin-shaped structures includes the following steps. A substrate including fin-shaped structures, and pad oxide caps and pad nitride caps covering the fin-shaped structures from bottom to top are provided. An isolation structure fills between the fin-shaped structures. A removing process is performed to remove a top part of the isolation structure and expose top parts of the fin-shaped structures. An oxidation process is performed to oxidize sidewalls of the top parts of the fin-shaped structures, thereby forming oxidized parts covering sidewalls of the top parts of the fin-shaped structures. The pad nitride caps are removed. The pad oxide caps and the oxidized parts are removed at the same time, thereby forming rounding fin-shaped structures.