The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 12, 2021

Filed:

Feb. 27, 2019
Applicant:

Macronix International Co., Ltd., Hsinchu, TW;

Inventors:

Chi-Min Chen, New Taipei, TW;

Yung-Tai Hung, Chiayi, TW;

Tuung Luoh, Taipei, TW;

Ta-Hung Yang, Miaoli County, TW;

Kuang-Chao Chen, Taipei, TW;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/768 (2006.01); H01L 23/532 (2006.01); H01L 27/11521 (2017.01); G11C 8/14 (2006.01);
U.S. Cl.
CPC ...
H01L 27/11521 (2013.01); G11C 8/14 (2013.01); H01L 21/76886 (2013.01); H01L 21/76889 (2013.01); H01L 23/53209 (2013.01);
Abstract

Provided is a word line structure including a substrate, a stack structure, and a metal silicide structure. The stack structure is disposed on the substrate. The metal silicide structure is disposed on the stack structure. The metal silicide structure includes a first metal element, a second metal element, and a silicon element. The first metal element is different from the second metal element, and concentrations of the first metal element and the second metal element gradually decrease along a direction from a top surface of the metal silicide structure to the substrate.


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