The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 12, 2021
Filed:
Feb. 17, 2017
Applicant:
Canon Kabushiki Kaisha, Tokyo, JP;
Inventors:
Masami Yonekawa, Utsunomiya, JP;
Yoichi Matsuoka, Shioya-gun, JP;
Assignee:
CANON KABUSHIKI KAISHA, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B29C 59/00 (2006.01); B29C 59/02 (2006.01); H01L 21/027 (2006.01); G03F 7/00 (2006.01); B29L 31/34 (2006.01);
U.S. Cl.
CPC ...
B29C 59/002 (2013.01); B29C 59/022 (2013.01); B29C 59/026 (2013.01); G03F 7/0002 (2013.01); H01L 21/0271 (2013.01); B29L 2031/3406 (2013.01);
Abstract
There is provided an imprint apparatus for forming a pattern of an imprint material on a substrate by using a mold, the imprint apparatus including a mold holding unit configured to hold the mold, and a substrate holding unit configured to hold the substrate, in which a particle is captured by generating a first region and a second region charged to different polarities in at least either one of a peripheral region of a region covered by the mold of the mold holding unit and a peripheral region of a region covered by the substrate of the substrate holding unit.