The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 05, 2021
Filed:
Feb. 22, 2019
Applicant:
Jeol Ltd., Tokyo, JP;
Inventors:
Yuji Kohno, Tokyo, JP;
Akiho Nakamura, Tokyo, JP;
Assignee:
JEOL Ltd., Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/00 (2006.01); H01J 37/22 (2006.01); H01J 37/28 (2006.01); H01J 37/26 (2006.01); H01J 37/153 (2006.01);
U.S. Cl.
CPC ...
H01J 37/226 (2013.01); H01J 37/153 (2013.01); H01J 37/26 (2013.01); H01J 37/28 (2013.01); H01J 2237/1532 (2013.01); H01J 2237/1534 (2013.01); H01J 2237/282 (2013.01); H01J 2237/2802 (2013.01); H01J 2237/2809 (2013.01);
Abstract
There is provided a method of aberration measurement capable of reducing the effects of image drift. The novel method of aberration measurement is for use in an electron microscope. The method comprises the steps of: acquiring a first image that is a TEM (transmission electron microscope) image of a sample; scanning the illumination angle of an electron beam impinging on the sample and acquiring a second image by multiple exposure of a plurality of TEM images generated at different illumination angles; and calculating aberrations from the first and second images.