The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 05, 2021
Filed:
Mar. 18, 2020
Asml Netherlands B.v., Veldhoven, NL;
Emil Peter Schmitt-Weaver, Eindhoven, NL;
Jens Stäcker, Eindhoven, NL;
Koenraad Remi André Maria Schreel, Veldhoven, NL;
Roy Werkman, Eindhoven, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
A first substratehas a calibration pattern applied to a first plurality of fieldsby a lithographic apparatus. Further substrateshave calibration patterns applied to further pluralities of fields. The different pluralities of fields have different sizes and/or shapes and/or positions. Calibration measurements are performed on the patterned substratesand used to obtain corrections for use in controlling the apparatus when applying product patterns to subsequent substrates. Measurement data representing the performance of the apparatus on fields of two or more different dimensions (fieldsin this example) is gathered together in a databaseand used to synthesize the information needed to calibrate the apparatus for a new size. Calibration data is also obtained for different scan and step directions.