The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 29, 2020

Filed:

Aug. 08, 2018
Applicant:

E Ink Holdings Inc., Hsinchu, TW;

Inventors:

Hsiao-Wen Zan, Hsinchu, TW;

Chuang-Chuang Tsai, Hsinchu, TW;

Hsin Chiao, Hsinchu, TW;

Wei-Tsung Chen, Hsinchu, TW;

Assignee:

E Ink Holdings Inc., Hsinchu, TW;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 29/66 (2006.01); H01L 29/40 (2006.01); H01L 21/28 (2006.01); H01L 29/423 (2006.01); H01L 29/78 (2006.01); H01L 21/84 (2006.01); C23C 18/12 (2006.01); H01L 21/461 (2006.01);
U.S. Cl.
CPC ...
H01L 29/401 (2013.01); C23C 18/1216 (2013.01); C23C 18/1254 (2013.01); C23C 18/1295 (2013.01); H01L 21/28008 (2013.01); H01L 21/461 (2013.01); H01L 21/845 (2013.01); H01L 29/42364 (2013.01); H01L 29/42376 (2013.01); H01L 29/66795 (2013.01); H01L 29/785 (2013.01);
Abstract

A transistor including a substrate, a source, a drain, an active portion, a fin-shaped gate, and an insulation layer is provided. The source is located on the substrate. The drain is located on the substrate. The active portion connects the source and the drain. The fin-shaped gate wraps the active portion. A first portion of the insulation layer separates the fin-shaped gate from the active portion, a second portion of the insulation layer separates the fin-shaped gate from the substrate, a third portion of the insulation layer separates the fin-shaped gate from the source and from the drain, and a fourth portion of the insulation layer is located on a surface of the fin-shaped gate facing away from the active portion. Here, the insulation layer is integrally formed.


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