The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 29, 2020

Filed:

Jan. 23, 2019
Applicant:

Jeol Ltd., Tokyo, JP;

Inventors:

Noriaki Mizuno, Tokyo, JP;

Toshikatsu Kaneyama, Tokyo, JP;

Assignee:

JEOL Ltd., Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/22 (2006.01); H01J 37/31 (2006.01); H01J 37/28 (2006.01); H01J 37/305 (2006.01); G01N 1/28 (2006.01);
U.S. Cl.
CPC ...
H01J 37/222 (2013.01); H01J 37/28 (2013.01); H01J 37/3056 (2013.01); H01J 37/31 (2013.01); G01N 2001/2873 (2013.01); H01J 2237/24475 (2013.01); H01J 2237/24485 (2013.01); H01J 2237/2804 (2013.01); H01J 2237/2807 (2013.01);
Abstract

A scanning electron microscope includes an FIB column, an SEM column, and a control unit which controls the FIB column and the SEM column. The control unit performs: processing to control the FIB column so that a cross-section of a specimen S is repeatedly exposed at predetermined intervals; processing to perform a first measurement to acquire a first image by irradiating a cross-section of the specimen S with an electron beam each time when a cross-section of the specimen S is exposed; and processing to perform a second measurement to acquire a second image by irradiating a cross-section of the specimen S with an electron beam each time when a cross-section of the specimen S is exposed n times (n is an integer of 2 or more).


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