The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 29, 2020
Filed:
Aug. 30, 2019
Intel Corporation, Santa Clara, CA (US);
John A. Swanson, Forest Grove, OR (US);
Vivek K. Singh, Portland, OR (US);
Kumara Sastry, Hillsboro, OR (US);
Kshitij Auluck, Hillsboro, OR (US);
Saumyadip Mukhopadhyay, Beaverton, OR (US);
Kasyap Thottasserymana Vasudevan, Portland, OR (US);
INTEL CORPORATION, Santa Clara, CA (US);
Abstract
A machine readable storage medium, a method and an apparatus. The method comprises selecting a candidate set of parameters from a plurality of available parameters comprising variables that affect an outcome of a lithography process; performing a set of optimizations wherein each optimization of the set of optimizations is subject to a plurality of objectives and tolerances and a set of constraints, wherein performance of said each optimization comprises: modifying values of at least a portion of the candidate set of parameters to derive a predicted outcome for said each optimization; and determining whether a difference between the predicted outcome and an intended outcome is within an error threshold; and if the difference exceeds the error threshold, perform a subsequent optimization, and otherwise generate an input file including modified values, corresponding to a last one of the set of optimizations, for the at least a portion of the candidate set of parameters.