The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 29, 2020
Filed:
Jun. 01, 2018
Applicant:
Jeol Ltd., Tokyo, JP;
Inventor:
Naoki Nishihagi, Tokyo, JP;
Assignee:
JEOL Ltd., Tokyo, JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01R 33/3875 (2006.01); G01R 33/44 (2006.01); G01R 33/46 (2006.01); G01R 33/24 (2006.01); G01R 33/56 (2006.01); G01R 33/00 (2006.01); G01R 33/561 (2006.01);
U.S. Cl.
CPC ...
G01R 33/3875 (2013.01); G01R 33/0017 (2013.01); G01R 33/243 (2013.01); G01R 33/443 (2013.01); G01R 33/4625 (2013.01); G01R 33/5608 (2013.01); G01R 33/5615 (2013.01);
Abstract
An offset map is determined in advance by a preliminary measurement process. A phase map is generated by execution of a long τ pulse sequence. A magnetic field map is calculated based on a phase map and a phase offset map. A shim adjustment is performed based on the magnetic field map. The offset map is calculated based on a first phase map acquired by execution of a first pulse sequence, a second phase map acquired by execution of a second pulse sequence, and a ratio α related to phase evolution periods.