The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 29, 2020
Filed:
Jun. 09, 2017
Rigaku Corporation, Akishima, JP;
Hisashi Konaka, Akiruno, JP;
Akihiro Himeda, Akishima, JP;
Toru Mitsunaga, Hachioji, JP;
Keigo Nagao, Saitama, JP;
RIGAKU CORPORATION, Tokyo, JP;
Abstract
Provided are a processing method, a processing apparatus and a processing program which can perform pole figure measurement continuously without overlapping of an angle a in a pole figure with the small number of times of ϕ scan, thereby enabling the efficient measurement. The processing method for determining conditions of pole figure measurement by X-ray diffraction, includes the steps of. receiving input of a diffraction angle 2θ; and determining an angle ω formed by an incident X-ray and an x-axis, and a tilt angle χ of a sample in each ϕ scan for a rotation angle ϕ within a sample plane so as to make a range of an angle a continuous from α=90° to α=0° without overlapping, the angle α being formed by the sample plane and a scattering vector, the range of the angle α are detectable at a time on a two-dimensional detection plane in the pole figure measurement at the diffraction angle 2θ, in which determining the angle ω and the tilt angle χ is repeated.