The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 29, 2020

Filed:

Sep. 09, 2016
Applicant:

Commissariat a L'energie Atomique ET Aux Energies Alternatives, Paris, FR;

Inventors:

Nicolas Posseme, Sassenage, FR;

Sébastien Barnola, Villard-Bonnot, FR;

Patricia Pimenta Barros, Grenoble, FR;

Aurélien Sarrazin, Grenoble, FR;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B29C 59/14 (2006.01); G03F 7/00 (2006.01); B29C 59/00 (2006.01); H01L 21/02 (2006.01); H01L 21/768 (2006.01); C08F 8/50 (2006.01); C08F 299/02 (2006.01); C08L 25/08 (2006.01); C08L 33/12 (2006.01);
U.S. Cl.
CPC ...
B29C 59/142 (2013.01); B29C 59/005 (2013.01); G03F 7/0002 (2013.01); H01L 21/02527 (2013.01); H01L 21/76856 (2013.01); B29C 2791/001 (2013.01); B29C 2791/005 (2013.01); C08F 8/50 (2013.01); C08F 299/024 (2013.01); C08L 25/08 (2013.01); C08L 33/12 (2013.01);
Abstract

A method for etching a layer of assembled block copolymer including first and second polymer phases, the etching method including a first step of etching by a first plasma formed from carbon monoxide or a first gas mixture including a fluorocarbon gas and a depolymerising gas, the first etching step being carried out so as to partially etch the first polymer phase and to deposit a carbon layer on the second polymer phase, and a second step of etching by a second plasma formed from a second gas mixture including a depolymerising gas and a gas selected among the carbon oxides and the fluorocarbon gases, the second etching step being carried out so as to etch the first polymer phase and the carbon layer on the second polymer phase.


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