The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 22, 2020
Filed:
Jul. 26, 2016
Applicant:
Taiwan Semiconductor Manufacturing Co., Ltd., Hsinchu, TW;
Inventor:
Han-Wen Liao, Taichung, TW;
Assignee:
TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD., Hsinchu, TW;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/02 (2006.01); H01L 29/66 (2006.01); H01L 21/67 (2006.01); H01J 37/317 (2006.01); H01L 21/306 (2006.01); H01L 21/3065 (2006.01); H01J 37/32 (2006.01); H01L 29/78 (2006.01);
U.S. Cl.
CPC ...
H01L 21/02071 (2013.01); H01J 37/317 (2013.01); H01J 37/32899 (2013.01); H01L 21/02057 (2013.01); H01L 21/02068 (2013.01); H01L 21/3065 (2013.01); H01L 21/30604 (2013.01); H01L 21/67196 (2013.01); H01L 21/67201 (2013.01); H01L 21/67213 (2013.01); H01L 29/66545 (2013.01); H01L 29/78 (2013.01); H01J 2237/317 (2013.01);
Abstract
A cluster tool includes a polyhedral transfer chamber, at least one processing chamber, at least one load lock chamber, and an electron beam (e-beam) source. The processing chamber is connected to the polyhedral transfer chamber. The processing chamber is configured to perform a manufacturing procedure to a wafer present therein. The load lock chamber is connected to the polyhedral transfer chamber. The e-beam source is configured to performing an e-beam treatment to the wafer after the wafer is performed the manufacturing procedure.