The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 22, 2020

Filed:

Jul. 09, 2018
Applicant:

Hitachi, Ltd., Tokyo, JP;

Inventors:

Akira Sugawara, Tokyo, JP;

Yoshio Takahashi, Tokyo, JP;

Tetsuya Akashi, Tokyo, JP;

Toshiaki Tanigaki, Tokyo, JP;

Assignee:

HITACHI, LTD., Tokyo, JP;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01J 37/20 (2006.01); H01J 37/244 (2006.01); H01J 37/22 (2006.01); G03H 5/00 (2006.01); H01J 37/04 (2006.01);
U.S. Cl.
CPC ...
H01J 37/20 (2013.01); G03H 5/00 (2013.01); H01J 37/045 (2013.01); H01J 37/22 (2013.01); H01J 37/244 (2013.01); G03H 2224/04 (2013.01); H01J 2237/043 (2013.01); H01J 2237/20 (2013.01);
Abstract

Continuous and automatic acquisition of electron beam holograms is made possible by using a sample holding mechanism that includes a sample end region that has a linear shape that is suited for electron beam holography, separates a thin-film rectangular window with an extreme-thin support film that supports a sample being disposed and a rectangular hole that has a linear-shaped edge and through which a reference wave is transmitted from each other, and configures a part of a layer that is thicker than the support film.


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