The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 15, 2020

Filed:

Mar. 29, 2018
Applicant:

Tokyo Electron Limited, Tokyo, JP;

Inventors:

Tsutomu Sakurabayashi, Nirasaki, JP;

Norihiko Tsuji, Nirasaki, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/67 (2006.01); B01D 53/26 (2006.01); B01D 53/06 (2006.01); B01D 53/44 (2006.01); H01L 21/687 (2006.01); H01L 21/677 (2006.01); B01D 53/04 (2006.01);
U.S. Cl.
CPC ...
H01L 21/67196 (2013.01); B01D 53/04 (2013.01); B01D 53/06 (2013.01); B01D 53/261 (2013.01); B01D 53/44 (2013.01); H01L 21/67017 (2013.01); H01L 21/67167 (2013.01); H01L 21/67766 (2013.01); H01L 21/67778 (2013.01); H01L 21/68707 (2013.01); B01D 2253/108 (2013.01); B01D 2256/10 (2013.01); B01D 2256/18 (2013.01); B01D 2257/70 (2013.01); B01D 2257/80 (2013.01); B01D 2258/0216 (2013.01); B01D 2259/40088 (2013.01);
Abstract

An atmospheric transfer deviceincludes a wafer transfer mechanismholding and transferring a wafer W; a housingaccommodating the wafer transfer mechanism; a gas supply unitsupplying an inert gas into the housing; a gas circulation unitreturning a gas discharged from the housingback into the housing; and a foreign substance removing unitremoving a foreign substance contained in the gas discharged from the housing. The foreign substance removing unitincludes a humidifying unitconfigured to add moisture to the gas discharged from the housing; a filterconfigured to adsorb and remove, by using the moisture, the foreign substance contained in the gas humidified by the humidifying unit; and a dehumidifying unitconfigured to remove the moisture from the gas from which the foreign substance is removed by the filter


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