The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 15, 2020
Filed:
May. 09, 2018
Applicant:
Applied Materials, Inc., Santa Clara, CA (US);
Inventors:
Brian T. West, San Jose, CA (US);
Michael S. Cox, Gilroy, CA (US);
Miroslav Gelo, Oakley, CA (US);
Dinkesh Huderi Somanna, Sunnyvale, CA (US);
Assignee:
Applied Materials, Inc., Santa Clara, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/32 (2006.01); H01J 37/34 (2006.01); C23C 14/56 (2006.01); H01L 21/285 (2006.01); C23C 14/04 (2006.01);
U.S. Cl.
CPC ...
H01J 37/3266 (2013.01); C23C 14/046 (2013.01); C23C 14/568 (2013.01); H01J 37/32009 (2013.01); H01J 37/32623 (2013.01); H01J 37/3405 (2013.01); H01L 21/2855 (2013.01);
Abstract
A PVD chamber deposits a film with high thickness uniformity. The PVD chamber includes a coil of an electromagnetic that, when energized with direct current power, can modify plasma in an edge portion of the processing region of the PVD chamber. The coil is disposed within the vacuum-containing portion of the PVD chamber and outside a processing region of the PVD chamber.