The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 15, 2020
Filed:
Jun. 12, 2019
Samsung Electronics Co., Ltd., Suwon-si, KR;
Sooyong Lee, Yongin-si, KR;
Bong-Soo Kang, Seoul, KR;
Kyoil Koo, Hwaseong-si, KR;
Sangtae Kim, Seoul, KR;
Kang-Min Jung, Seoul, KR;
Samsung Electronics Co., Ltd., Gyeonggi-do, KR;
Abstract
A method of fabricating a semiconductor device includes designing a layout, forming a photomask based on the layout, correcting an optical transmittance of the photomask, and performing a photolithography process using the photomask having the corrected optical transmittance to form a pattern on a substrate. The correcting the optical transmittance of the photomask includes creating an intensity map by capturing light that passes through the photomask, simulating the layout to create a virtual intensity map, and correcting an optical transmittance of a mask substrate of the photomask based on the intensity map and the virtual intensity map.