The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 15, 2020
Filed:
Jan. 11, 2018
Applicant:
Asml Netherlands B.v., Veldhoven, NL;
Inventors:
Hans Butler, Best, NL;
Michael Johannes Vervoordeldonk, Rosmalen, NL;
Maurice Willem Jozef Etiënne Wijckmans, Eindhoven, NL;
Assignee:
ASML Netherlands B.V., Veldhoven, NL;
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/20 (2006.01);
U.S. Cl.
CPC ...
G03F 7/709 (2013.01); G03F 7/7085 (2013.01); G03F 7/70516 (2013.01);
Abstract
A lithographic apparatus is described, the apparatus comprising:
Butler, Hans. (2020). Lithographic apparatus and device manufacturing method (U.S. Patent No. 10866529). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/10866529
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile