The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 15, 2020
Filed:
Nov. 07, 2018
Applicant:
Taiwan Semiconductor Manufacturing Company Ltd., Hsinchu, TW;
Inventors:
Assignee:
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD., Hsinchu, TW;
Primary Examiner:
Int. Cl.
CPC ...
G06F 30/398 (2020.01); G03F 1/70 (2012.01);
U.S. Cl.
CPC ...
G03F 1/70 (2013.01); G06F 30/398 (2020.01);
Abstract
A method for manufacturing a photomask is provided. The method includes generating a plurality of virtual layouts; calculating a score for each of the plurality of virtual layouts in accordance with a total overlay area; comparing the scores of the plurality of virtual layouts and determining a modified layout having a target score out of the plurality of virtual layouts; and outputting the modified layout to a photomask. Each of the virtual layouts includes a plurality of the shifted features. A semiconductor manufacturing method is also provided.