The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 15, 2020

Filed:

Apr. 29, 2016
Applicant:

Carl Zeiss Microscopy Gmbh, Jena, DE;

Inventors:

Lars Stoppe, Jena, DE;

Thomas Milde, Nausnitz, DE;

Johannes Winterot, Jena, DE;

Assignee:
Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G02B 21/06 (2006.01); G02B 21/36 (2006.01); G06T 5/50 (2006.01); G06T 5/00 (2006.01);
U.S. Cl.
CPC ...
G02B 21/367 (2013.01); G02B 21/06 (2013.01); G06T 5/001 (2013.01); G06T 5/50 (2013.01); G06T 2207/10056 (2013.01); G06T 2207/10152 (2013.01); G06T 2207/20224 (2013.01);
Abstract

The invention relates to a reflection correction method for correcting digital microscopic images. Here, the reflection correction method comprises: illuminating an object, the illuminating of the object having at least two illumination patterns. Creating an illumination pattern image of the object for each illumination pattern. Calculating at least one partial reflection image, in each case by means of a combination of corresponding two illumination pattern images. Calculating a reflection-corrected image of the object by means of a suitable combination of at least one illumination pattern image and at least one partial reflection image. And, in this case, each illumination pattern as at least one active illumination source, and each illumination pattern is different from all others. Furthermore, the invention relates to an associated reflection-correcting device.


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