The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 08, 2020
Filed:
Mar. 14, 2019
Applicant:
Toshiba Memory Corporation, Minato-ku, JP;
Inventors:
Assignee:
TOSHIBA MEMORY CORPORATION, Minato-ku, JP;
Primary Examiner:
Int. Cl.
CPC ...
H01L 29/06 (2006.01); H01L 29/417 (2006.01); H01L 29/78 (2006.01); H01L 29/423 (2006.01);
U.S. Cl.
CPC ...
H01L 29/0619 (2013.01); H01L 29/0642 (2013.01); H01L 29/0692 (2013.01); H01L 29/41725 (2013.01); H01L 29/42356 (2013.01); H01L 29/78 (2013.01);
Abstract
A semiconductor memory device includes an n-type source/drain formed in a surface region of a p-type active region, and a gate. The semiconductor memory device also includes a withstand voltage improvement layer provided with a preset distance maintained from at least one end of the source/drain. N-type impurities are diffused in the withstand voltage improvement layer, and a withstand voltage improvement voltage is applied to the withstand voltage improvement layer to expand a depletion layer to reach the source/drain, so that the maximum withstand voltage value of a transistor is increased.