The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 08, 2020

Filed:

May. 09, 2017
Applicant:

Mitsubishi Electric Corporation, Chiyoda-ku, JP;

Inventors:

Takanori Tanaka, Tokyo, JP;

Shigehisa Yamamoto, Tokyo, JP;

Yu Nakamura, Tokyo, JP;

Yasuhiro Kimura, Tokyo, JP;

Shuhei Nakata, Tokyo, JP;

Yoichiro Mitani, Tokyo, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 29/15 (2006.01); C30B 29/36 (2006.01); H01L 21/205 (2006.01); H01L 29/78 (2006.01); H01L 29/12 (2006.01); H01L 21/20 (2006.01);
U.S. Cl.
CPC ...
C30B 29/36 (2013.01); H01L 21/20 (2013.01); H01L 21/205 (2013.01); H01L 29/12 (2013.01); H01L 29/78 (2013.01);
Abstract

An epitaxial substrate includes a single-crystal substrate of silicon carbide, and an epitaxial layer of silicon carbide disposed on the single-crystal substrate. The epitaxial layer includes a first epitaxial layer disposed on the single-crystal substrate, a second epitaxial layer disposed on the first epitaxial layer, and a third epitaxial layer disposed on the second epitaxial layer. The first epitaxial layer has a basal-plane-dislocation conversion rate of less than 95%. The second epitaxial layer has a basal-plane-dislocation conversion rate of more than 98%.


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