The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 08, 2020
Filed:
Dec. 06, 2016
Applicant:
Taiwan Semiconductor Manufacturing Company, Ltd., Hsin-Chu, TW;
Inventors:
Assignee:
Taiwan Semiconductor Manufacturing Company, Ltd., Hsinchu, TW;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C23C 16/455 (2006.01); C30B 25/14 (2006.01); C23C 16/458 (2006.01); H01L 21/02 (2006.01); H01J 37/32 (2006.01); H01L 21/314 (2006.01); C30B 31/16 (2006.01); C23C 16/46 (2006.01);
U.S. Cl.
CPC ...
C23C 16/45527 (2013.01); C23C 16/455 (2013.01); C23C 16/4583 (2013.01); C23C 16/45544 (2013.01); C23C 16/45546 (2013.01); C23C 16/45548 (2013.01); C23C 16/45574 (2013.01); C23C 16/45578 (2013.01); C23C 16/46 (2013.01); C30B 25/14 (2013.01); C30B 31/16 (2013.01); H01J 37/3244 (2013.01); H01L 21/0228 (2013.01); H01L 21/3141 (2013.01);
Abstract
An atomic layer deposition apparatus includes a chamber including a plurality of regions; and a heating device respectively providing specific temperature ranges for the plurality of regions. By flowing precursor gases at different flow rates in the different regions, thin films can be simultaneously formed in the different regions having different film thicknesses.