The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 01, 2020

Filed:

Mar. 22, 2017
Applicant:

Mitsubishi Electric Corporation, Chiyoda-ku, JP;

Inventors:

Kohei Ebihara, Tokyo, JP;

Masayuki Furuhashi, Tokyo, JP;

Takanori Tanaka, Tokyo, JP;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 29/872 (2006.01); H01L 29/47 (2006.01); H01L 29/12 (2006.01); H01L 29/78 (2006.01); H01L 21/28 (2006.01); H01L 29/06 (2006.01); H01L 29/16 (2006.01); H01L 29/417 (2006.01);
U.S. Cl.
CPC ...
H01L 29/872 (2013.01); H01L 21/28 (2013.01); H01L 29/06 (2013.01); H01L 29/0634 (2013.01); H01L 29/0696 (2013.01); H01L 29/12 (2013.01); H01L 29/1608 (2013.01); H01L 29/41741 (2013.01); H01L 29/47 (2013.01); H01L 29/78 (2013.01); H01L 29/7811 (2013.01);
Abstract

A semiconductor device includes an n-type drift layer formed on a semiconductor substrate having an off-angle, plurality of p-type pillar regions formed in the drift layer, and a surface electrode formed on the drift layer including the plurality of p-type pillar regions. A plurality of withstand voltage holding structures which are p-type semiconductor regions are formed in a surface layer of the drift layer including the plurality of p-type pillar regions to surround an active region. Each of the plurality of p-type pillar regions has a linear shape extending in a direction of the off-angle of the semiconductor substrate. Each of the plurality of withstand voltage holding structures has a frame-like shape including sides extending in parallel with the plurality of p-type pillar regions and sides perpendicular to the plurality of p-type pillar regions in a planar view.


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